OET inaugural cover | 30 years of nanoimprint lithography: Leading the new era of nanomanufacturing
Professor L. Jay Guo’s group from the University of Michigan published a comprehensive review titled “30 years of nanoimprint: development, momentum and prospects” in the inaugural issue of Opto-Electronic Technology, systematically summarizing key developments and future trends in NIL, with a special focus on industry advancements in nano-Si device manufacturing and nanophotonics.
The review elaborates extensively on two main NIL methods: thermal NIL (T-NIL) and UV NIL (UV-NIL), examining ...