Argonne researchers use AI to optimize a popular material coating technique in real time
To make computer chips, technologists around the world rely on atomic layer deposition (ALD), which can create films as fine as one atom thick. Businesses commonly use ALD to make semiconductor devices, but it also has applications in solar cells, lithium batteries and other energy-related fields.
Today, manufacturers increasingly rely on ALD to make new types of films, but figuring out how to tweak the process for each new material takes time.
Part of the problem is that researchers primarily use trial and error to identify optimal growth conditions. But a recently published study -- one of the first in this scientific field -- suggests that using artificial intelligence (AI) can be more efficient.
In the ACS Applied ...














